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High Purity Gas Stainless Steel Pneumatic Diaphragm Valve 1/4 inch High Pressure

Short Description:

Features

▶The maximum working pressure can reach 31mpa

▶Fully wrapped valve seat design, with superior anti expansion and anti pollution ability

▶Nickel cobalt alloy diaphragm has higher durability and corrosion resistance

▶The standard roughness is Ra0 twenty-five μ M (grade BA), or electropolishing Ra0 thirteen μ M (EP grade) optional

▶Helium test leakage rate < 1 × 10-9std cm3/s

▶Optional pneumatic actuator

▶The service life of pneumatic valve can reach 100000 times


Product Detail

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Parameters

Applications

FAQ

Product Tags

Product Description

diaphragm valve

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  • Specification of Pneumatic Diaphragm Valve

    Technical Data
    Port size
    1/4″
    discharge coefficient (Cv)
    0.2
    Maximum working pressure
    Manual
    310 bar (4500 psig)
    Pneumatic
    206 bar (3000 psig)
    Working pressure of pneumatic actuator
    4.2~6.2 bar (60~90 psig)
    working temperature
    PCTFE:-23~65℃(-10~150℉)
    Leakage rate (helium)
    inside
    ≤1×10-9 mbar l/s
    external
    ≤1×10-9 mbar l/s

     

    Flow data
    air@ 21℃(70℉) water @ 16℃(60℉)
    Pressure drop of maximum air pressure bar (psig )
    air (lmin)
    water (l/min)
    0.68 (10)
    64
    2.4
    3.4 (50)
    170
    5.4
    6.8 (100)
    300
    7.6

    Cleaning process

    ▶standard(WK-BA)
    All welded joints shall be cleaned according to the company’s standard cleaning and packaging specifications.
    When ordering, there is no need to add suffix
    ▶Oxygen cleaning(WK-O2)
    Product cleaning and packaging specifications for oxygen environment can be provided. This product meets the
    requirements of astmg93c cleanliness. When ordering, please add – O2 after the order number
    ▶Ultra high purity(WK-EP)
    Can provide controlled surface finish, electropolishing Ra0 thirteen μ m. Deionized
    water ultrasonic cleaning. To order, add – EP after the order number
     
    Main-structural-materials
    Main structural materials
    Serial number
    element
    texture of material
    1
    Handle
    aluminium
    2
    Actuator
    aluminium
    3
    Valve stem
    304 SS
    4
    Bonnet
    S17400
    5
    Bonnet nut
    316 SS
    6
    Button
    brass
    7
    diaphragm (5)
    Nickel cobalt alloy
    8
    valve seat 
    PCTFE 
    9
    valve body
    316L SS

    Dimensions and ordering information

    Straight through type
    size
    Dimensions are in inches (mm) is for reference only
    微信截图_20220916162018
    Basic order number
    Port type and size
    sizein.(mm)
    A
    B
    C
    L
    WV4H-6L-TW4-
    1/4″ Tube -W
    0.44 (11.2)
    0.30 (7.6)
    1.12 (28.6)
    1.81 (45.9)
    WV4H-6L-FR4-
    1/4″ FA-MCR
    0.44 (11.2)
    0.86 (21.8)
    1.12 (28.6)
    2.85 (72.3)
    WV4H-6L-MR4-
    1/4″ MA-MCR1/4
    0.44 (11.2)
    0.58 (14.9)
    1.12 (28.6)
    2.85 (72.3)
    WV4H-6L-TF4-
    OD
    0.44 (11.2)
    0.70 (17.9)
    1.12 (28.6)
    2.85 (72.3)

    Industries involved

    TFT-LCD

    The process special gases used in the CVD deposition process of TFT-LCD manufacturing process are silane (S1H4), ammonia (NH3), phosphine (PH3), nitrous oxide (N2O), NF3, etc. In addition, high purity hydrogen and high purity nitrogen and other bulk gases are also involved in the process. Argon is used in the sputtering process, and the sputtered film forming gas is the main material for sputtering. First, it is required that the film-forming gas cannot react with the target, and the most appropriate gas is inert gas. A large amount of special gas will also be used in the etching process, while the electronic special gas is mostly flammable, explosive and highly toxic, so the requirements for gas circuit and technology are very high. Wofei Technology specializes in the design and installation of ultra-high purity special gas transmission system.
    Hf94b06b9cb2d462e9a026212080db1efQ
    Special gases are mainly used in film forming and dry etching processes in LCD industry. There are many kinds of LCD, among which TFT-LCD is the most widely used LCD technology due to its fast response time, high imaging quality and gradually lower cost. The manufacturing process of TFT-LCD panel can be divided into three stages: front array, middle cell and rear module assembly. The electronic special gas is mainly used in the film forming and dry etching stages of the front array process. After multiple film forming processes, SiNx non-metallic films and metal films such as grid, source, drain and ITO are respectively deposited on the substrate.
     H37005b2bd8444d9b949c9cb5952f76edW

    Q1. What about the lead time?

    A:Sample needs 3-5 days, mass production time needs 1-2 weeks for order quantity more than

    Q2. Do you have any MOQ limit ?

    A: Low MOQ 1 pic.

    Q3. How do you ship the goods and how long does it take to arrive?

    A: We usually ship by DHL, UPS, FedEx or TNT. It usually takes 5-7 days. Airline and sea shipping also optional.

    Q4. How to proceed an order ?

    A: Firstly let us know your requirements or application.

    Secondly We quote according to your requirements or our suggestions.

    Thirdly customer confirms the samples and places deposit for formal order.

    Fourthly We arrange the production.

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